Welcome to the Nishi research group website at Stanford University

Our group has been working in the area of both evolutionary and revolutionary nanoelectronics from process and device point of view for CMOS in the ITRS node of 45-32nm and beyond, including expansion to three dimensional integration. The group consists of EE and MSE students, research staff members, industrial visiting scholars, and consulting professors, which has interdisciplinary nature of talents and research activities

Please navigate our website for further information.

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